Ar 辅助Al 等离子体辐射谱分析
DOI:
作者:
作者单位:

作者简介:

通讯作者:

中图分类号:

基金项目:


Author:
Affiliation:

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    Nd∶YAG脉冲激光聚焦到Al 靶表面,烧蚀Al 靶,产生Al 等离子体。用Ar 气作保护气 时,将诱发Ar 气电离,产生丰富的Ar + 离子辐射。文中根据Ar + 离子辐射信息,分析了Ar Ⅱ385. 06nm、Ar Ⅱ386. 85nm、Ar Ⅱ404. 29nm等三条谱线的时间分辨行为,计算了Al 等离子体离子辐射时期的电子温度;估算了特征辐射时期的电子密度。结果发现:在Al 等离子体离子辐射时期,电子温度约1. 2~1. 9eV ,随延迟时间增加,单调递减;在特征辐射时期,电子密度大约是2 ×1018 cm- 3 。

    Abstract:

    Focusing an Nd∶YAGpulsed laser beam onto surface of an aluminum(Al) target ,ablating it ,Al plasma would be induced upon the surface. Protected with Ar in the process ,it would induce atom Ar breakdown ,and farther more ,a lot of Ar+ ionic characteristic radiations appeared accompanying the A l plasma ’s emitting. Based on the Ar + ionic characteristic radi-ations ,we studied time2resolved behavior of three Ar+ ionic characteristic lines ,Ar Ⅱ385. 06nm ,Ar Ⅱ386. 85nm and Ar Ⅱ404. 29nm ,respectively. Electron temperature of the plasma in the stage of ionic emission was approximately calculated. Electron number density of the plasma in the stage of Al characteristic radiation was estimated. The results show that , in the stage of ionic emission ,the electron temperature of the plasma ranged from 1. 2 to 1. 9eV ,and decreased successively with delayed time increasing. In the stage of Al characteristic radiation ,electron number density of the plasma was about 2×1018cm- 3 .

    参考文献
    相似文献
    引证文献
引用本文

宋一中 贺安之. Ar 辅助Al 等离子体辐射谱分析[J].激光与红外,2004,34(3):
.[J]. LASER & INFRARED,2004,34(3):

复制
分享
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:
  • 最后修改日期:
  • 录用日期:
  • 在线发布日期: 2004-06-09
  • 出版日期: