Thin titanium nitride (TiNX) films were prepared by using filterd arc plasma method to meet the requirements of the application of the thin films in dynamic infrared2ray scene generator. Thickness of the prepared thin films was between 7.5nm and 75nm. Microstructures ,temperature coefficient of resistance ,temperature stability and the micromachining of the TiNX thin films were investigated into details. lt has been shown that the thin TiNXfilms are good candidate materials for dy2 namic infrared2ray scene generation application.