The fine atomic sources is the important factor in atom lithography,a experiment set-up for realization of ultra-high vacuum chromium atomic sources was reported.In our experiment system,the parameters are that vacuum more than 5.0×10-5Pa,temperature of chromium sources is 1650℃,the probable velocity of chromium atom is 960m /s,the numbers of chromium atoms out of oven is N=1.5×1017s-1.
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张文涛;李同保.用于铬原子光刻的超高真空原子源的研制[J].激光与红外,2007,37(2):155~157 ZHANG Wen-tao; LI Tong-bao. Development of Ultra-high Vacuum Chromium Atomic Sources in Atom Lithography[J]. LASER & INFRARED,2007,37(2):155~157