Abstract：HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure. The depositions were carried out under an oxygen-nitrogen-argon atmosphere at room temperature. Crystallographic structure and microstructure of HfOxNy thin films were studied with X-ray diffraction (XRD),scanning electron microscope (SEM) and atomic force microscopy (AFM). Fourier transform infrared spectroscopy and UV-VIS spectrophotometer were applied to gain the optical properties of HfOxNy thin films. The results of X-ray diffraction indicated that hafnium oxynitride phase was formatted in a region of oxygen partial pressure. Cross-section of the films observed by SEM revealed that the films grew with a columnar-type structure,and surface observation with AFM showed higher oxygen partial pressure had lower surface roughness than lower oxygen partial pressure. After coated,compared to ZnS substrates,in 0.35～2μm region,the transmittance changed obviously with the variation of the oxygen partial pressure,the transmittance changed in the 2～12μm waveband were not remarkable.