The minor carrier lifetime of InGaAs(100) after treatment with (NH4)2S solution was measured by the microwave photoconductivity decay (μ-PCD). The result shows that SRV of the InGaAs after treatment with (NH4)2S solution approach that of the nearly ideal InP/InGaAs interface. For better evaluating effect of sulfur, SiNx is deposited on surface of the InGaAs for fabricating MIS. Through measuring the CV properties, the statement of interface is confirmed.
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韩冰,王妮丽,唐恒敬,龚海梅.(NH4)2S硫化处理后InGaAs表面特性的研究[J].激光与红外,2007,37(13):944~946 HAN Bing, WANG Ni-li, TANG Heng-jing, GONG Hai-mei. The Surface Properties of InGaAs Passivated with (NH4)2S[J]. LASER & INFRARED,2007,37(13):944~946