At present,the semiconductor chips′ processing is developing toward 22 nm.The most probable method to achieve this size is EUV Lithography.The light emitted from EUV sources is very short (13.5 nm),and most of substances would absorb this radiation strongly,so using the transmission optics to collect the radiation is impossible.How to collect the radiation emitted from EUV sources efficiently becomes a big problem in EUV Lithography.This paper presents two kinds of EUV source Collector,near normal incidence collector and grazing incidence collector,and some designs or instances of them.Emphasis is put on the introduction about the nested grazing incidence Wolter Ⅰ Collector.