CdTe(211)B films were grown by molecular beam epitaxy on As-passivated nominal three-inch Si(211)wafer using thin interfacial ZnTe(211)B buffer layer,and in-situ cyclic annealing has been used during CdTe deposition to improved crystal quality.The CdTe films were characterized with Optical microscopy,X-ray diffraction,AFM,FTIR and wet chemical defect etching.The results indicate that the CdTe(112)B films has good crystal quality,excellent uniformity over three-inch area,twin-free and the crystalline orientation is controlled.
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周立庆,刘铭,巩锋,董瑞清,折伟林,常米.3英寸CdTe/Si复合衬底外延技术研究[J].激光与红外,2011,41(5):537~541 ZHOU Li-qing, LIU Ming, GONG Feng, DONG Rui-qing, SHE Wei-lin, CHANG Mi. Study on MBE CdTe layer on 3 inch silicon substrate[J]. LASER & INFRARED,2011,41(5):537~541