A near infrared broadband anti-reflection coating was designed on CaF2 substrate,and its wavelength range is from 0.9 μm to 1.7 μm.The basic design principle of the initial structure of the broadband antireflection film was analyzed.The films were fabricated by electron beam physical vapor deposition(EBPVD).Titanium oxide(TiO2) and silicon oxide(SiO2) were used as high index and low index material in this process.The transmittance of the sample was measured by spectrophotometer,and the broadband anti-reflection films were coated on both sides.The test result indicates that its average transmittance is about 98.95% which is consistent with the design result.Environment test indicates that the films have good performances on stability and firmness.It can be used in some rigorous environments.