分子束外延InAs/GaSbⅡ类超晶格的缺陷研究
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Research on defects of type Ⅱ InAs/GaSb superlattices grown by MBE
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    摘要:

    InAs/GaSb Ⅱ类超晶格被认为制备第三代高性能红外探测器的优选材料。本文对GaSb衬底上分子束外延生长的Ⅱ类超晶格材料缺陷进行了研究,首先对材料表面缺陷分类,然后分析了各类缺陷的起源,并研究了生长温度、GaSb生长速率、As/In束流比等对超晶格表面缺陷的影响,对制备高性能大面阵探测器的Ⅱ类超晶格材料生长具有参考价值。

    Abstract:

    Type Ⅱ InAs/GaSb superlattices have the characteristics of adjustable band gap,high quantum efficiency,low dark current,easy fabrication for large array,etc,so it is the main material for the third generation infrared detectors. Type Ⅱ InAs/GaSb superlattices was grown by MBE on GaSb substrate,and the defects of material surface were classified and its causes were analyzed. The influences of growth temperature,growth rate of GaSb,As/In ratio on defects were studied. Through the optimization of growth conditions,high quality type Ⅱ InAs/GaSb superlattices were obtained,which has a certain reference for the fabrication of high quality large format type Ⅱ InAs/GaSb superlattices infrared detectors.

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邢伟荣,刘铭,尚林涛,周朋,周立庆.分子束外延InAs/GaSbⅡ类超晶格的缺陷研究[J].激光与红外,2016,46(9):1106~1109
XING Wei-rong, LIU Ming, SHANG Lin-tao, ZHOU Peng, ZHOU Li-qing. Research on defects of type Ⅱ InAs/GaSb superlattices grown by MBE[J]. LASER & INFRARED,2016,46(9):1106~1109

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  • 在线发布日期: 2016-09-30
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