短波碲镉汞电子雪崩二极管的模拟仿真
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Simulation of short-wave HgCdTe avalanche photodiodes
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    摘要:

    碲镉汞e-APD器件可用于低弱信号检测,碲镉汞材料工艺、器件工艺及器件结构设计对器件性能非常重要。本文采用silvaco软件对平面PIN结构的短波碲镉汞e-APD器件的暗电流、雪崩增益和量子效率进行了仿真分析。结果表明:1)高工作电压下,器件暗电流的主要成分是带间直接隧穿电流;2)工艺因素引入的接近禁带中心的陷阱能级决定器件在中等偏压下的暗电流特性;3)带间直接隧穿和电子碰撞电离主要发生在低掺杂的雪崩放大区;4)在固定偏压下,器件的暗电流和雪崩增益随着雪崩放大区宽度的上升而减少;5)在固定偏压下,器件的雪崩增益随吸收层厚度的增加而轻微增加,同时量子效率逐渐下降。为实现高性能的短波碲镉汞e-APD器件,需要合理设计器件结构和优化材料生长工艺及器件制造工艺。

    Abstract:

    HgCdTe e-APD has been used to detect weak signals. Material growth technique,device process technique and structure design are important for the performance of HgCdTe e-APD.The dark current,avalanche gain and quantum efficiency of a short wave planar PIN device are simulated by silvaco software. The results show that:1)band-to-band tunneling current is the dominated dark current component;2)trap levels that are near the center of the energy gap are the major source of dark current at middle voltage;3)band-to-band tunneling and Impact ionization occur in the light doping avalanche zone;4)at a certain voltage,the dark current and avalanche gain decrease when the width of avalanche gain zone is narrowed;5)at a certain voltage,the avalanche gain increases slightly due to the increase of width of the absorb film,meanwhile the quantum efficiency decreases. Short-wave HgCdTe e-APD with high performace can be achieved under well design of device structure,material growth technique and device process technique.

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张智超,闻娟.短波碲镉汞电子雪崩二极管的模拟仿真[J].激光与红外,2018,48(8):1014~1019
ZHANG Zhi-chao, WEN Juan. Simulation of short-wave HgCdTe avalanche photodiodes[J]. LASER & INFRARED,2018,48(8):1014~1019

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  • 在线发布日期: 2018-08-28
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