To realize the characters of a dual-band cut-off visible region that selectively transmit light of wavelengths of 0.4～0.8 μm but cut off the wavelengths of 0.3～0.4 μm and 0.8～1.1 μm on sapphire substrate.The dual-band cut-off film system that cut off near-infrared and near ultraviolet was chosen to be the initial structure which to be broad band-pass filter that is highly transparent in visible light on the side of the sapphire substrate.Titanium dioxide film material is selected as high refractive index material and silicon oxide film material as low refractive index material in order to achieve the purpose of dual-band cut-off.Through film system design,the thickness of 42 layers was 3.6 μm,the electron beam physical vapor deposition(EBPVD) was used to fabricate the coatings;the transmittance of the sample was measured from the spectrophotometer.The average cut-off depth of 0.029 % and 0.127 % corresponded to the band from 0.3～0.385 μm and the band from 0.824～ 1.1 μm respectively from the test result.The average transmittance was up to 97.68 % for the pass band from 0.405～0.788 μm,the half-width HFWD of the passband is 398 nm(402～800 nm),which the “half-wave hole” phenomenon is effectively suppressed and has the characteristics of double-band cut-off and high passband transmittance.In the environmental tests:the coatings was remarkably stable and matched with each other well.So that the dual-band cut-off visible filter can be applied in extreme cases.