The silicon three-dimensional micro/nanostructures have important applications in infrared imaging and detection.However,due to the limitation of processing technology,it is still a challenge to prepare complex three-dimensional micro/nanostructures on the silicon.This paper presents the idea of preparing three-dimensional micro/nanostructures by etching-assisted femtosecond laser gray-scale modification technology.The oxide siliconlayers prepared by laser modification can act as the etching mask,and then three-dimensional structures are fabricatedafter etching.The research indicates that laser processing parameters,such as laser power and scanning pitch,can adjust the anti-etching ability of the oxide layer.The controllable preparation of three-dimensional microstructures with stepped,slope shape and complex curved surfaces can be realized by etching the locally controlled anti-etching oxide layer pattern which is programming-designed.Besides,it also verifies the feasibility of this technology in the preparation of silicon-based micro-optical elements with complex profiles.
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李乾坤,刘学青,成荣.刻蚀辅助激光灰度改性技术制备硅基三维微结构[J].激光与红外,2021,51(3):274~278 LI Qian-Kun, LIU Xue-Qing, CHENG Rong. Fabrication of silicon 3D microstructures by etching assisted femtosecond laser gray-scale modification[J]. LASER & INFRARED,2021,51(3):274~278